| PDF
Reverse
Bias Behavior of Surface Mount Solid Tantalum Capacitors
Alexander
Teverovsky, PhD
QSS Group Inc./NASA
1. Introduction
1.1. Background
Solid
tantalum capacitors are polarized devices designed to operate only
under forward voltage bias conditions. Application of reverse voltage
may produce high leakage currents with potentially destructive results.
Such misapplications of these devices sometimes occur during bench
testing, troubleshooting of engineering modules and/or during some
malfunctions in operating systems. However, more serious consequences
of reverse bias application are caused by incorrect installation
of the capacitor on the board.
In
practice, the situation sometimes arises where assembled hardware
is suspected of having one or more solid tantalum capacitors installed
backwards. Verification of this problem is often complicated by
the expense of disassembling hardware for close inspection. In these
situations, program managers would benefit from a risk assessment
that predicts possible consequences of reverse installation in the
intended application and the probability of failures in the system
within the mission operation time. Unfortunately, there is only
limited published research regarding the ability of solid tantalum
capacitors to survive such conditions. The manufacturers of solid
tantalum capacitors provide very conservative guidelines regarding
momentary reversals of polarity with no guarantee of performance
under prolonged exposures to reverse voltages.
In
this work, we explore the behavior of three lots (20 V, 35 V and
50 V rated) of solid tantalum chip capacitors from one manufacturer
under various reverse bias conditions.
Content
of the paper:
1. Introduction
1.1 Background
1.2 Summary of published guidelines and research
2. Experimental
3. Results
3.1
Forward bias leakage current characterization
3.2 Reverse bias currents at low voltages
3.3 Degradation under reverse bias conditions
3.4 Reverse bias stress results at 25%VR and 50%VR
4. Discussion
4.1
Conduction mechanism in forward-biased tantalum capacitors
4.2 Mechanism of reverse bias degradation
4.3 Factors affecting failures in systems with inversely installed
tantalum capacitors
5. Conclusion
6. References
7. Acknowledgement
1.2. Summary
of Published Guidelines and Research
Existing
military specifications for surface mount solid tantalum capacitors
(MIL-PRF-55365) do not address the issue of survivability of tantalum
capacitors in reverse bias conditions. Users are left to consult
guidelines offered by major manufacturers of tantalum capacitors.
Generally speaking, these guidelines tend to be highly conservative
so as not to imply any guarantee of performance when the user misapplies
the device. Common guidelines offered indicate that these capacitors
can withstand reverse voltages equal to 10% to 15% of the forward
DC voltage rating at room temperature. When ambient temperature
increases, this voltage is reduced typically to 3%-5% at 85° C and
to 1% at 125° C. One manufacturer seems to be especially concerned
about the reverse bias conditions limiting the peak reverse voltage
to 10% of VR or to 1V max at 25 ° C, 3% of VR
or 0.5V max at 85° C and 1% of VR or 0.1V max at 125°
C. The manufacturers emphasize that these ratings cover only exceptional
conditions of small level excursions into incorrect polarity and
are not intended to cover continuous reverse voltage operation.
The
probability of failures of incorrectly installed solid tantalum
capacitors has long been an issue in the aerospace community. G.
J. Ewell from The Aerospace Corporation addressed this issue in
1984 by analyzing behavior of hermetically sealed metal case solid
tantalum capacitors under reverse bias conditions [1]. He found
that a long-term reverse bias exposure considerably increases the
device leakage current measured under forward bias condition, but
does not significantly affect the capacitance and dissipation factor.
Some lots of 35 V and 50 V rated capacitors survived 200 and even
8900 hours of reverse bias testing (RBT) at voltages up to 40% of
rated voltage (VR). However, the survival rate was not
100% and the behavior was judged to be lot related.
The
conclusion made by G. J. Ewell that the existing manufacturer guidelines
are extremely conservative concurs with the results of the testing
performed at Hughes in 1988 [2]. In that work it was shown that
some capacitors could withstand reverse voltage up to 25% of VR
with very little degradation occurring below 15% of VR.
In all cases healing began to occur after 5 minutes of the application
polarity being corrected. These experiments suggested that while
solid tantalum capacitors can survive substantial reverse bias without
failure, this behavior significantly varies from manufacturer to
manufacturer.
Solid
tantalum capacitors have been widely used in electronics, including
military and aerospace applications, for more than 20 years. However,
the processes of the reverse voltage bias degradation are still
not yet completely understood. The physical origin of reverse voltage
currents and mechanisms of failures under reverse bias conditions
in solid tantalum capacitors have been analyzed by several groups
of researchers.
I.
Bishop and J. Gill from AVX Corp. [3] believe that the reverse-bias
failures are due to high density currents flowing through very small
areas of microcracks or other defects in the dielectric layer. This
results in creation of hot spots in the amorphous tantalum pentoxide
and causes its conversion into the more conductive crystalline form.
The crystallization can eventually cause a short circuit failure
of the capacitor. According to this model one might expect a correlation
between the forward and reverse currents, which most likely are
flowing through the same defects. However, no such correlation was
observed and failures under reverse bias conditions could not be
predicted based on any forward or reverse bias measurements. It
was found that the reverse voltage behavior of tantalum capacitors
is similar for different manufacturers, but varies significantly
from lot to lot.
A
model explaining rectifying properties of Ta capacitors was suggested
by Sikula, et al. at the 2001 Capacitor and Resistor Technology
Symposium (CARTS) [4]. The model considered a tantalum capacitor
as a metal-insulator-semiconductor (MIS) structure with the tantalum
being the metal, tantalum pentoxide being the insulator and manganese
oxide being the semiconductor. The rectifying is due to formation
of depletion or inversion layers in the semiconductor at the MnO2
/ Ta2O5 interface. The forward bias leakage
current in the capacitor is due to electrons flowing through traps
in the Ta2O5 layer and is limited by a barrier
at the MnO2 – Ta2O5 interface.
This forward leakage current has an activation energy of 0.3 eV
to 0.6 eV. Under reverse bias conditions and voltages above 1.5V,
the barrier virtually disappears thus significantly increasing the
reverse current, which in this case has an activation energy between
0.7 eV to 1.1 eV. However, the time evolution of the currents in
this model was not considered.
Y.
Pozdeev-Freeman explained rectifying in solid tantalum capacitors
by structural differences at the Ta / Ta2O5
and Ta2O5 / MnO2 interfaces [5,
6]. According to this model, conductive TaO particles that form
at the Ta-Ta2O5 interface act as spikes concentrating
electrical field in the dielectric thus significantly increasing
injection of electrons from the tantalum cathode.
There
is no current consensus even on the nature of conduction in the
tantalum pentoxide layers. Some authors assume that the conduction
is due to ionic currents [7, 8] while others suggest that it is
due to electron transport either by a Pool-Frenkel mechanism [9]
or by a trap hopping mechanism [10].
The
purpose of this work was to gain more insight into the nature and
physical origin of electrical conduction in tantalum capacitors
and to analyze degradation processes in the surface mount parts
under reverse bias conditions.
2. Experimental
Three
groups of surface mount CWR09 type tantalum capacitors manufactured
by one supplier and described in the following table were chosen
for the experiments.
|
Capacitor
|
VR
|
Lot
DC
|
|
22
uF
|
20
V
|
9804
|
|
6.8
uF
|
35
V
|
9821
|
|
4.7
uF
|
50
V
|
9822
|
All
capacitors were screened to the military specifications thus providing
high confidence in the quality of the parts used in our experiments.
A
number of experiments were carried out at different voltages and
temperatures to characterize short-term and long-term evolution
of the leakage currents under reverse bias conditions.
Polarization
and depolarization currents (currents in a biased and in a short
circuited capacitor) measured at different voltages and temperatures
as well as frequency dependencies of C and ESR were used to investigate
degradation mechanism during reverse bias stresses. Figure 1a shows
schematics of a circuit used for measurements of the polarization
and depolarization currents in capacitors. Typically a limiting
resistor of R = 10 Ohm was used to restrict inrush currents in the
capacitors. At this value of R, the discharge currents in capacitors
became negligible and charge currents stabilized after a few milliseconds.
This means that the polarization and depolarization currents observed
at times of more than 10 to 100 milliseconds are due to the processes
of charge redistribution within the tantalum pentoxide layer of
the capacitors.
To
analyze degradation in solid tantalum capacitors the parts were
subjected to multiple reverse bias cycling (RBC) with each cycle
including reverse bias stress (RBS) followed by forward bias measurements
(FBM). Leakage currents were monitored on capacitors during both
RBS and FBM periods.
a)
b)
c)
Figure 1. Schematics
for (a) measurements of polarization and depolarization currents
and (b) for reverse bias cycling (RBC) test. Figure 1c illustrates
the voltage diagram during the RBC test, which consists of reverse
bias stress followed by forward bias measurements.
The
FBM included measurements of currents during depolarization, Idr,
forward bias polarization, Ip, and repeat depolarization,
Idf. Figures 1b and 1c illustrate a test circuit and
a time diagram for this technique. The duration of the first RBS
period was typically 1000 seconds and these periods were increased
with logarithmical increments in the following cycles. Typically
from 11 to 20 cycles were performed during each test which resulted
in the total reverse-bias times from 20 to more then 250 hours.
The duration of each depolarization and polarization period during
FBM was 330 seconds.
3.1.
Forward Bias Leakage Current Characterization
The
forward bias characterization was performed in an attempt to understand
conduction mechanisms in tantalum capacitors.
A
characteristic feature of the forward bias leakage currents in tantalum
capacitors is their decay with time after applying voltage. Typical
I-t curves of forward bias leakage currents at various voltage levels
are shown in Figure 2 for the three groups of capacitors. At relatively
low voltages, below 10V to 20V, forward leakage currents follow
the power law, IF ~ t-n with the exponent
n varying from 0.75 to 0.9 for polarization times up to 30 minutes.
At higher voltages there is a tendency for current saturation with
time. This behavior suggests that the forward currents are a sum
of the absorption current, which varies with time according to the
power law, and the conductivity current, which does not depend on
time. Similar behavior of forward bias leakage currents is well
known for solid tantalum capacitors [11].
In
our experiments the absorption currents did not vary significantly
from sample to sample. However, the conductivity currents in different
capacitors varied more than an order of magnitude.
Depolarization
currents at low voltage levels also tend to decrease with time roughly
according to the power law. Notably, the absolute magnitude of the
polarization and depolarization currents are nearly the same when
measured at relatively low voltage levels.
Figure
3 shows polarization and depolarization characteristics measured
at relatively low voltages for 35V and 50V rated capacitors, and
at rated voltage for a 20 V capacitor in the temperature range from
20 ° C to 150 ° C. At low voltages and/or temperatures, when the
conduction currents are negligible, the polarization and depolarization
currents are closely related. An increase in temperature from 20
°C to 100 ° C caused an increase in absorption currents of approximately
one order of magnitude and virtually did not change the rate of
decay (the n value). At temperatures above 100 ° C the depolarization
currents tended to saturate.
Figure
2. Typical room temperature current decay at different forward voltages
for 20V (a), 35V (b) and 50V(c) capacitors. The lines show approximation
of the current relaxation according to the power law with the power
n = 0.73-0.83 in (a), n = 0.81 in (b) and n = 0.81 – 0.89 in (c).
The
observed data suggest that absorption currents are due to the hopping
transport mechanism [10]. A simplified model for electron hopping
transport predicts that for a trap distribution that is uniform
in energy, the current should decay reciprocally with time [12].
Retrapping of electrons and widening of the trap energy distribution
would cause deviation from the simple t-1 model. This
is the most likely reason why we found the exponent to be less than
1 in our experiments.
Figure
3. Comparison between polarization and depolarization currents for
20V (a), 35V (b) and 50V (c) capacitors. In figures b) and c) marks
indicate depolarization currents and lines indicate polarization
currents.
The
density of the traps, Nt, can be estimated by the value
of the absorbed charge in the capacitor, Qa as follows:

where
q is the charge of an electron;
A is the volume of the oxide layer;
Id(t) is the depolarization current.
The
volume of the tantalum pentoxide A can be estimated considering
that during formation the oxide growth rate, b , is approximately
1.7 to 2.2 nm per volt and that the formation voltage is approximately
3 to 4 times larger than the rated voltage, VR. With
these assumptions, the thickness and the effective surface area
of the oxide film in a capacitor can be calculated as:
,
where m is the formation voltage constant, m =3 –
4.
,
where e is the dielectric constant of tantalum pentoxide
(e = 27) and e 0 = 8.85 10-12 F/m is the permittivity
of free space.
We
observed that exposing solid tantalum capacitors to elevated ambient
temperature and forward voltages resulted in saturation of depolarization
currents at T > 100 ° C and applied voltages close to VR.
By these reasons depolarization currents at 150° C after forward
bias polarization at rated voltages were used to estimate the Nt
values. Results of these calculations, which are displayed in Table
1, suggest that the trap density Nt » 1018
cm-3 and does not depend significantly on the type of
capacitor. This value is in agreement with the estimations of trap
density in tantalum pentoxide films made by S. Khanin [13].
Table
1. Estimated characteristics of tantalum pentoxide films.
|
C,
m F
|
VR,
V
|
d,
nm
|
S,
cm2
|
V,
cm3
|
Nt,
cm-3
|
|
22
|
20
|
140
|
129
|
1.80E-03
|
8.6E+17
|
|
6.8
|
35
|
245
|
70
|
1.71E-03
|
6.3E+17
|
|
4.7
|
50
|
350
|
69
|
2.41E-03
|
1.2E+18
|
Leakage
currents in the 20V capacitors were mostly due to charge absorption
caused by electron hopping through the oxide traps. This mechanism
was dominant even at high temperatures (150 ° C) and applied voltages
(20V), suggesting that the conductivity currents were less than
a few nanoamperes. However, for the 35V and 50V capacitors a substantial
portion of the leakage current, especially at high temperatures
and voltages, was due to the conductivity of the oxide layer. This
allowed for analysis of the I-V characteristics of the conduction
currents. Figure 4 shows typical current - electric field characteristics
for the 50V tantalum capacitors measured at high temperatures. The
characteristics indicate a Pool-Frenkel conduction which can be
described as follows:
,

where
B is a trap-density related constant;
E is the electric field;
U is the activation energy;
k is the Bolzmann constant;
T is the absolute temperature;
a is a constant equal to the slope of the line in the Pool-Frenkel
coordinates.
Estimations
of the slope a in Figure 4 gave values from 0.0017 (V/cm)-0.5
at 75 ° C to 0.0033 (V/cm)-0.5 at 175 ° C. Calculations
per the above equation yields a = 0.0048 (V/cm)-0.5 and
0.0037 (V/cm)-0.5 respectively at 75 ° C and 175 ° C.
Considering rough estimations used for calculations of the electrical
field and possible effect of polarization currents, the agreement
between experimental and theoretical data seems reasonable.

Figure
4. Pool-Frenkel plot of the current - electrical field, E, data
calculated at different temperatures for a 50V capacitor.
Typical
temperature dependencies of forward leakage currents plotted with
Arrhenius coordinates are shown in Figure 5.
|
a)
|
|
b)
|
Figure
5. Temperature dependencies of forward currents for 20V (a) and
35V/50V (b) capacitors at rated voltages in the range from 20 °
C to 175 ° C. The observed hysteresis is due to current relaxation.
These
measurements were performed during heating up to 175 ° C and then
cooling at a rate of 4 ° C/min. An initial sharp drop in the current
was due to the current decay after applying 50V at room temperature.
With decreasing temperature the currents decreased exponentially
allowing for estimation of activation energy. Measurements on 50V
and 35V tantalum capacitors gave close activation energies of U
= 0.5 eV to 0.52 eV. The 20V capacitors had higher activation energies
of 0.65 eV to 0.73 eV. Extrapolation of the curves shown in Figure
5a to room temperature gave leakage currents for the 20V capacitors
below 0.1 nA. This result confirms that for the 20V capacitors the
currents observed at room temperature were mostly due to charge
absorption at traps in the tantalum pentoxide film.
Note
that the currents measured at increasing temperatures could also
be straightened in the Arrhenius plot resulting in lower activation
energies of 0.25 eV to 0.4 eV. This is due to a component of the
leakage current caused by the charge absorption (polarization) which
has relatively weak temperature dependence. This might partially
explain the wide variation of the activation energies reported in
literature.
3.2.
Reverse Bias Currents at low voltages
Reverse
bias currents were measured on groups of 3 to 5 capacitors from
each of the three lots at test voltages in the range of 1 V to 5
V. The reverse current characteristics (I vs. t) were similar for
different samples from the same group. Figure 6a shows an example
of reproducibility of these characteristics for 50 V capacitors.
At room temperature and reverse voltages below 2V, similar to the
forward bias conditions, the reverse leakage currents in all groups
of capacitors decreased with time according to the power law with
the exponent, n, varying from 0.8 to 1.1. At higher reverse voltages
the leakage current increases with time following a relatively short
period of current decrease.
Figure
6b shows forward and reverse I-V characteristics of the capacitors
with leakage currents measured after 100 seconds of polarization.
The I-V characteristics for the three groups of capacitors were
similar with somewhat higher currents for the 20V capacitors. This
suggests that the absorption currents, which dominate for short
polarization times, were similar for different types of capacitors.
The
effect of temperature on reverse bias polarization and depolarization
currents measured at 2V is shown for a 35V capacitor in Figure 7.
Similar to forward bias conditions, at low temperatures, below 75
° C, polarization and depolarization currents were closely related
and followed the power law indicating that the same electron hopping
mechanism of conductivity is also dominant under low voltage, low
temperature reverse bias conditions. At temperatures above 75 °
C, polarization currents became much larger than depolarization
currents and manifested an increasing-with-time trend. Additional
measurements showed that at high temperatures this upward I(t) trend
was observed even at reverse bias voltages as low as 1V.
|
a)
|
|
b)
|
Figure
6. Reverse currents in 50V capacitors (a) and 100-second I-V characteristics
of different groups of capacitors (b).

Figure
7. Polarization (lines) and depolarization (marks) currents in a
35V capacitor at 2V of reverse bias and temperatures from 20 °
C to 150 ° C.
To
check the reproducibility of reverse-bias currents, reverse- and
forward-bias measurements were repeated after depolarization for
1000 seconds. Figure 8 shows typical results of the repeat measurements
obtained for the 50V capacitors polarized at 5V of reverse bias.
Repeatable forward and reverse characteristics were observed in
all three capacitor ratings after a relatively low-voltage (below
5V) and short (less then a few hours) reverse bias polarization.
Figure
8. Typical curves showing reproducibility of reverse bias I-t characteristics
of tantalum capacitors.
Temperature
variations of reverse currents were measured during heating up from
room temperature to 175 ° C and then cooling to approximately 75
° C in one 35V and one 50V capacitor at 2V. Results of these measurements
are shown in Figure 9. The observed hysteresis was approximately
3 to 4 orders of magnitude and was due to the reverse currents increasing
with time. Similar to the forward bias conditions, at high temperatures
variations of reverse currents followed the Arrhenius law with activation
energy of 0.4 eV– 0.42 eV.
3.3.
Degradation under Reverse Bias Conditions
Reverse
bias leakage currents were monitored on groups of three capacitors
of each voltage rating during reverse bias cycles (RBC) as it was
described in the experimental section (see Figures 1b, c).

Four
groups of 50V capacitors were tested at 3V, 5V, 7V, and 9V of reverse
bias. The results of the test are shown in Figure 10. In all cases
the currents initially declined with time during a period which
decreased with increasing voltage from approximately 1000 s at 3V
to 10 - 20 s at 9V. After this current-declining period, the currents
gradually increased 2 to 3 orders of magnitude over several hours.
Each consequent reverse bias cycle during the 3V, 5V, and 7V tests
resulted in similar I vs. t curves with some decreasing of the current-declining
period and increasing of the current levels. This indicated that
only partial reversibility occurred during the interim forward bias
measurements (FBM). The interim FBM during the 3V, 5V, and 7V tests
were performed at 10V of forward bias. During the 9V test the interim
measurements were performed at 50V of forward bias, which resulted
in much better reproducibility of the I vs. t curves (see Figure
10d) and suggested a virtually complete reversibility of the reverse
bias degradation process.

Figure
9. Arrhenius plots for a 35V and a 50V capacitors measured at 2V
reverse bias and temperature range from 20 ° C to 175 ° C.
During
the RBT of the 50 V rated capacitors one sample failed after the
10th 9V cycle (approximately 2 hours of stress) and another sample
failed after the 13th cycle (12 hours of reverse bias stress). However,
these failures occurred not under the reverse bias conditions, but
during the interim 50V FBMs. Figure 11 shows results of these interim
measurements. No significant variations from measurement to measurement
were observed in the current decay up to the cycles at which the
failure was observed. The failures occurred after several seconds
under forward voltage due to time-dependent dielectric breakdown,
thus indicating a weakening of the parts during the reverse bias
stress.
Figure
10. Reverse bias test cycles of 50V tantalum capacitors at different
voltages. Different lines indicate different cycles of reverse bias
stress. Note that the interim measurements during tests at 3V, 5V,
and 7V were performed at a forward voltage of 10V. The interim measurements
during the 9V testing were performed at 50V.
Typical
time evolution of currents during the RBT cycles for the three capacitor
ratings is shown in Figure 12. In all cases the currents slightly
decreased with time (during 10 to 1000 seconds, which is not seen
on these hours-scaled charts) following approximately 10 to 20 hours
of current increase and then stabilized at somewhat lower level.
Similar to what was observed in [1], the stabilization currents
in many cases were not steady but exhibited erratic variations around
the quasi-stabilization level. These quasi-stabilization levels
observed in experiments at different reverse voltages are shown
in Table 2.
In
some instances at relatively high reverse voltages of approximately
20% VR or more, the quasi stabilization levels tended
to increase with time as shown in Figure 12d. In these cases the
parts either eventually failed due to thermal run away or stabilized
at a certain leakage current level.
|
a)
|
|
b)
|
Figure
11. Interim forward-bias measurements on the 50V capacitors, SN
1 (a) and SN 3 (b), performed at rated voltage during the 9V reverse
bias testing.
Table
2. Levels of quasi-stabilization currents (m A) during the reverse
bias tests at different voltages.
|
Capacitor
|
Reverse
bias
|
|
3V
|
5V
|
7V
|
9V
|
|
20V
|
500-1000
|
5000
- 9000
|
-
|
-
|
|
35V
|
4-9
|
>1000
|
2000
- 5000
|
-
|
|
50V
|
2-12
|
>100
|
400-600
|
700
- >1000
|
Figure
12. Examples of reverse current evolution with time during reverse
bias cycles for the 20V (a), 35V (b, d) and 50V (c) capacitors.
For the 20V and 50V capacitors the current was limited to 1 mA.
Figure
13 displays reverse I-V characteristics measured on a 35V capacitor
after a long-term (more then 100 hours) 7V reverse bias cycling
stress. To decrease the effect of depolarization caused by the voltage
interruption between the testing and measurement conditions, the
interim measurements were performed at reverse voltages starting
at 7V (the voltage at which the parts were stressed), gradually
decreasing to 0.1V and then increasing back to 7V. The I-V characteristics
measured during the first few hours of the test exhibited significant
hysteresis with currents at the decreasing branch of the curve being
2 to 3 orders of magnitude larger than at the increasing branch.
This indicates that even a short-term decrease in the reverse voltage
at early stage of the stress might reverse degradation process.
After approximately 100 hours of stress, which corresponds to the
7th interim measurement cycle, the hysteresis was significantly
less and the I-V curves could be roughly approximated with the power
law, I ~ Vn, where n ~ 1.66. Further testing resulted
in decreasing of the reverse currents at 7V by approximately an
order of magnitude and, what is most interesting, in saturation
of the I-V curves at
V > 1.5V.

Figure
13. Interim reverse I-V characteristics of a 35V capacitor during
reverse bias testing at 7V.
3.4.
Reverse bias stress results at 25% and 50% VR
Two
groups of 10 samples each were taken from each of the three capacitor
rating lots. One group was stressed at 25% VR and the
other at 50% VR applied in reverse direction. The reverse
currents were monitored for up to 4400 hours of the testing.
Typical
I vs. t curves for the testing at 50% VR (reverse bias)
are shown in Figure 14. Most of the 35V and 50V capacitors failed
within first 1000 seconds of this test. The failure manifested as
a sharp increase in reverse leakage currents to more than 100 mA.
Subsequent measurements of the failures under forward bias conditions
showed that the forward leakage currents were increased to 0.1 mA
to 10 mA compared to less than 1 m A prior to the test. If a sample
was not removed from the test immediately after the failure had
occurred, discoloration of the plastic package was observed indicating
overheating of the part. In all cases the discoloration was observed
evenly around the surface of the tantalum slug. The uniform distribution
of the damage suggests that the reverse bias failures occur due
to an even distribution of high-density currents over the tantalum
pentoxide layer. By contrast, parts that fail under forward bias
conditions generally exhibit a localized failure site within the
pentoxide film. Obviously, this uniformity appeared only on the
macroscopic scale and most likely was due to irregularities of micrometer
size which had excessive current density and were evenly distributed
along the surface of the slug.

Figure
14. Typical I-t curves during reverse bias tests at 50% of rated
voltage. All 35V and 50V capacitors failed with leakage currents
of more than 100 mA within first several minutes of testing.
With
50% of VR applied in reverse bias the 20V capacitors
initially had rather high currents which varied within the range
from 1 to 100 mA. However, no catastrophic failures were observed
in this group even after 250 hours of the stress. After the test
these capacitors had excessive forward leakage currents ranging
from micro- to milliamperes.
Reverse
currents during the 25% VR test for the 35V and 50V capacitors
significantly increased with time during the first several hours
of testing and then varied erratically in the milliampere range.
Figure 15 exhibits time evolution of currents for all capacitors
in the 50V group. Most of the parts failed after approximately 250
hours of the stress. It is important to note that all failures occurred
within 20 to 40 hours after the reverse bias was interrupted for
replacement of the limiting resistors. The 100 Ohm resistors, which
had been used initially for approximately 230 hours, were replaced
with 10 Ohm resistors to reduce changes of the voltage across the
capacitors when the currents increase above 10 mA. Comparison of
currents right before and immediately after this replacement did
not reveal any significant changes in reverse currents which is
understandable considering that the voltage drop on the limiting
resistors was decreased by the replacement from less than 4%-6%
to less than 0.4%-0.6%.

Figure
15. Reverse bias test results for ten 50V capacitors at 25% rated
voltage.
The
kinetics of failures for both types of capacitors are shown in Figure
16. An increase in the applied voltage from 25% VR to
50% VR resulted in decreasing of the median time-to-failure
by more than three orders of magnitude. However, considering possible
impact of the test interruption, the time-to-failure during 25%
VR test could be much larger and the difference between
the 25% VR test and the 50% VR test could
be much more dramatic.
In
the 20 V group only one failure occurred after 280 hours of the
25% VR reverse bias test (also after the testing interruption
for replacement of the resistors). All other capacitors survived
2400 hrs of testing with the currents stabilizing in the range from
4 mA to 10 mA. After 2400 hours of testing four capacitors were
removed for analysis and 5 remaining capacitors were stressed up
to 4400 hours. After 4400 hours under bias the power supply was
turned off and then turned on after approximately 15 hours. Two
more parts (out of five) failed within several minutes after the
power had been reapplied.
|
|
|
a)
|
|
b)
|
Figure
16. Kinetics of failures for 35V (a) and 50V (b) capacitors during
reverse bias tests at 25% and 50% of rated voltage.
AC
characteristics (capacitance at 1 kHz and ESR at 100 kHz) were measured
on all capacitors, which did not fail hard short circuit, after
the 25% and 50% VR stresses. In spite of significantly
increased leakage currents, no dramatic changes occurred in C and
ESR values after the 50% VR test: the values of capacitance
decreased by 3% to 5% and the ESR values increased by 20% to 40%.
Figure 18 shows before/after test correlation in capacitance and
ESR for parts subjected to 25% VR reverse bias testing.
Here also, the capacitance decreased by a few percent and the resistance
increased by 30% to 100 %. These data concur with the results reported
in [1].
a)
b)
Figure
17. Effect of 25%VR reverse bias testing on capacitance (a) and
ESR (b) for the three types of capacitors. The lines correspond
to the no-change characteristics.
Figure
18 shows changes in frequency dependencies of C and ESR for the
20V rated capacitors after 2400 hours of reverse bias at 25% VR.
Similar degradation in the frequency dependencies was observed with
the 35V and 50V rated capacitors after reverse bias testing. As
expected from the C and ESR measurements, no significant changes
occurred at low and high frequencies. However in the range from
3 kHz to 300 kHz capacitance after the test was 25% to 50% reduced
compared to the initial values. This indicates a substantial increase
in the capacitance roll-off effect. This degradation was most likely
caused by an increase of the resistance of the manganese dioxide
layer [17, 18]. The reverse bias stress also resulted in several
times increase of the ESR at frequencies below 30 kHz. This effect
might be due to the increased conductivity of tantalum pentoxide
layers.
a)
b)
Figure
18. Effect of 2400-hour reverse bias testing at 5V on AC characteristics
of 20V tantalum capacitors.
A
typical forward current decay in the 20V capacitors subjected to
the 25% VR testing is shown in Figure 19. The forward
currents decreased with time according to the power law, I ~ t-n,
with the decay rate, n, varying from 0.26 to 0.35. Compared to the
initial curves, the forward currents after the reverse bias stress
were several times higher, and the rate of the decay was significantly
lower. Initially, the n values were 0.75 to 0.9 but after the test
they varied for different samples from 0.15 to 0.35.
4. Discussion
The
observed experimental data can be explained based on physical notions
of the processes in the valve metal (niobium, tantalum) – amorphous
oxide (Nb2O5, Ta2O5)
systems which were suggested first in [14, 15] and then later developed
by one of the co-authors for solid tantalum capacitors [5, 6]. According
to these notions, the Ta/Ta2O5 system, which
is formed by anodizing tantalum, is in a thermodynamically non-equilibrium
condition and relaxes to a stable state by chemical reduction-oxidation
reactions at the Ta/Ta2O5 and MnO2/Ta2O5
interfaces and related structural transformations. The relaxation
is accomplished by two processes: crystallization and reduction
of the Ta2O5 to lower oxide states. These
processes were started with the formation of Ta/Ta2O5
interface, then accelerated during high temperature treatments at
the time of manufacturing and might slowly continue during the whole
life span of the capacitors.

Figure
19. Typical polarization curves after long-term reverse bias testing.
The slope of the lines varied from 0.27 to 0.33
-
Conduction
Mechanism in Forward-biased Tantalum Capacitors
Under
normal operating conditions, oxygen ions from a Ta2O5
film move into the bulk Ta thus decreasing the internal energy of
the system and leaving positively charged oxygen vacancies, VO+
, in the oxide near the tantalum surface. Under electrical field
in the oxide these vacancies migrate towards the Ta2O5/MnO2
interface. The MnO2, being a strong oxidizer, easily
emits oxygen ions which recombine with the arrived oxygen vacancies.
The process is controlled by the VO+ generation
and might proceed with crystallization of the oxide film forming
conductive TaO inclusions at the Ta/Ta2O5 interface.
The probability of the inclusion formation strongly depends on the
quality of the tantalum anode and, in particular, on the oxygen
content and on existence of the thermal oxide layer under the anodized
tantalum pentoxide.
The
ionic currents caused by the VO+ and O-
migration could be large enough at high temperatures, above approximately
250 ° C, and are responsible for the galvanic cell properties of
the Ta/Ta2O5/MnO2 system. The activation
energy of the ionic currents is relatively high, ~ 1.85 eV, so the
level of ionic currents at temperatures below 150 ° C is negligibly
small. Crystallization in tantalum oxide films was observed at a
high temperature of 480 ° C after 5-60 minutes of annealing in air
on Ta films saturated with oxygen. This process occurs in a thermal
oxide layer, which is formed under the anodic oxide and is much
less resistant to crystallization [19]. At normal operating conditions
of tantalum capacitors both relaxation processes, the reduction
of the tantalum pentoxide and crystallization at the Ta/Ta2O5
interface, occur extremely slowly and the ionic subsystem
(oxygen vacancies and oxygen ions) virtually does not affect the
behavior of the electronic subsystem.
Within
the range of operation temperatures of tantalum capacitors the dominant
conduction mechanism is related to electron migration in tantalum
pentoxide layers. This migration occurs via electron hopping transport,
resulting in the absorption currents, and via Pool-Frenkel mechanism
resulting in the conduction currents. The first mechanism is mostly
dependant on volume properties of the tantalum pentoxide layer (traps’
concentration and distribution) whereas the second one is controlled
by the Ta2O5/MnO2 and/or Ta/Ta2O5
interface conditions (work function and local electric field).
The sites of the interfaces with some structural irregularities,
which increase local electric field in the pentoxide layer and/or
decreased work function for electron emission, are most likely favorable
for the Pool-Frenkel transport mechanism. Combination of these two
mechanisms can explain time-, voltage-, and temperature evolution
of the forward bias leakage currents. The first mechanism prevails
at relatively low temperatures and voltages while the second one
dominates at high temperatures and voltages.
4.2.
Mechanism of Reverse Bias Degradation
As
it was shown in our experiments, a characteristic feature of reverse
currents in tantalum capacitors is gradual increase with time (for
several hours) following a relatively short period of current decrease.
A typical time evolution of reverse currents includes three stages:
current decay, gradual current increase, and erratic behavior when
the currents quasi-stabilize. This suggests three different processes
governing degradation in reverse biased tantalum capacitors during
these three periods.
First
stage. At relatively low reverse voltages polarization and depolarization
kinetics is similar to what was observed at forward voltages. This
indicates that during the first stage the current decay is most
likely due to the same mechanisms that control forward biased currents.
Second
stage. The gradual increase of reverse currents during the second
stage can be explained by accumulation of the oxygen vacancies at
the tantalum cathode. Unlike the forward bias conditions, the positively
charged oxygen vacancies generated at the Ta/Ta2O5
interface do not migrate toward the MnO2 layer, but are
piling up at the tantalum electrode. Besides, oxygen vacancies existing
in the bulk of the oxide layer also will be swept toward the Ta/Ta2O5
interface by the applied reverse bias. Accumulation of the positively
charged oxygen vacancies reduces the barrier for electron emission
into the oxide and provides additional traps for electrons in the
oxide thus resulting in significant increase of reverse currents.
Third
stage. A high level of electron emission from the Ta cathode
occurs preferably at irregularities at the Ta/Ta2O5
interface. Under reverse bias conditions these local currents increase
with time to the level which is sufficient to overheat micro-sites
in the opposed MnO2 layer. This local overheating will
cause oxygen emission from the MnO2 layer and its reduction
to the lower level, high resistive oxides (Mn2O3).
Both processes, the oxygen emission and the manganese reduction,
will reduce local reverse currents and result in quasi-stabilization
in the system. The first, by supplying oxygen through diffusion
in Ta2O5 and neutralizing positively charged
oxygen vacancies. The second process by limiting the reverse currents
due to increased resistivity of manganese layer (well-known self-healing
mechanism). The reduction of manganese also explains the observed
increase of the roll-off effect in capacitors (see Figure 18). Both
processes occur locally at different points in time and are most
likely responsible for the erratic variation of currents during
the third stage of the reverse bias stress.
Another
possible mechanism, which results in decreasing and stabilizing
of reverse currents, is electron trapping at states related to oxygen
vacancies at the Ta/Ta2O5 interface. This
trapping reduces the effective positive charge and thus decreases
the emission of electrons from the tantalum cathode.
At
the first and second stages the degradation process still might
be completely reversible. Application of a forward bias would sweep
the oxygen vacancies to the Ta2O5/MnO2
interface where they would be neutralized by oxygen ions from
the MnO2 layer as it occurs under normal operating conditions.
Similar relaxation would occur even during depolarization without
applying of forward voltage due to diffusion of the oxygen vacancies
and/or their migration in the internal electrical field in the tantalum
pentoxide layer.
Experiments
have shown that restoration of characteristics of capacitors after
the bias reversal from reverse to forward occurs very fast, within
a few seconds or less. This allows an estimation of the mobility
of oxygen vacancies in Ta2O5 using the following
expression:
,
where
d is the thickness of the oxide; V is the applied voltage; t is
the time of the migration. For rough estimations we can assume the
oxide thickness d = 200 nm, the applied voltage V = 10 V, and the
duration of the transport t = 10 s. The calculation yields
m = 4´ 10-12 cm2/(V´ s).
A
relatively high mobility of oxygen vacancies in ceramics was shown
in [16]. Experiments with the perovskite-type titanates showed that
the mobility of the oxygen vacancies was (1 – 6)´ 10-8
cm2/Vs at temperatures of 160 - 190 ° C. Considering
relatively high activation energy for ions, the mobility of oxygen
vacancies at room temperature would be several orders of magnitude
lower, which is in reasonable agreement with our estimations.
At
high reverse voltages the accumulation of oxygen vacancies increases
local currents to the level where they might be limited by the emission
capability of the tantalum cathode. In this case the appearance
of the reverse I-V curves (see Figure 13) is similar to the forward
characteristics of vacuum diodes. In a vacuum diode forward currents
first increase with voltage according to the Child and Langmuir
3/2 law (I ~ V3/2) and then saturate at levels which
exponentially depend on the cathode temperature.
A
weakening of the electrical strength of the dielectric layers in
solid tantalum capacitors was also observed after long-term testing
under reverse bias conditions (see Figure 11). This might be due
to crystallization of the tantalum pentoxide which is facilitated
by excessive concentration of oxygen vacancies at the Ta/Ta2O5
interface and increased local temperature at existing irregularities.
The excessive VO+ concentration and related
electron traps were also likely responsible for the increased absorption
currents and decreased rate of the current decay after long-term
reverse bias testing (see Figure 19).
An
interesting feature of the behavior of reverse biased capacitors
during the third stage of degradation is an initiation of failures
by the bias interruption. In several instances hard failures of
the capacitors occurred in time ranging from a few minutes to a
few hours after the voltage was turned off and then reapplied. This
effect can be explained assuming that after the reverse bias is
turned off the oxygen vacancies, VO+, diffuse
from the Ta/Ta2O5 interface into the oxide
and then, after the bias is reapplied, redistribute back to the
interface. Originally, oxygen vacancies were generated more or less
evenly along the Ta/Ta2O5 interface, however
after voltage reapplication they would mostly concentrate at sites
with structural irregularities where the electrical field is larger.
Similar redistribution would result in higher than original concentration
of the positively charged vacancies at the irregularities thus increasing
the electron emission to the level when destruction of the oxide
and a hard failure of the capacitor would occur.
Another
possible mechanism of these triggered-by-interruption failures is
related to the processes of electron capture and emission from the
VO+-related traps. The voltage removal will
cause emission of the trapped electrons from the states at the Ta/Ta2O5
interface thus increasing the effective positive charge created
by oxygen vacancies. After reapplying of the reverse voltage, retrapping
of the electrons would take some time during which the effective
positive charge and correspondingly the local current density would
be higher that they had been before the voltage interruption.
4.3.
Factors affecting failures in systems with inversely inserted Ta
capacitors
Experiments
showed that reverse bias stresses during 10 to 20 hours even at
relatively low voltages would increase forward leakage currents
above the specification limits which signifies a formal failure
of the capacitor. However for a system with inversely inserted capacitors
the level of forward leakage currents is not important and the failure
condition (the critical level of reverse current) should be determined
specifically for each application condition.
Depending
on external and material parameters of tantalum capacitors, a reverse
bias current can either degrade to a level after which a thermal
runaway would occur, or it might stabilize at a certain level exhibiting
erratic current variations. In the first case a hard short in the
capacitor and consequently a failure of the system would occur.
In the second case one might expect some degradation of AC characteristics
(relatively minor decrease in C, increase in ESR and in the roll-off
effect) and substantial increase in the leakage currents (up to
tens of milliamperes). However, no hard short circuit failures would
happen for thousand of hours provided the system can remain operational
at high levels of leakage currents. It should be noted that in this
case, the leakage currents will not be stable and the reversed biased
capacitors would generate significant noise possibly resulting in
malfunctions in sensitive circuits.
The
external parameters that affect reverse bias behavior of tantalum
capacitors include applied voltage, temperature, thermal resistance,
and specific features of the circuit application, in particular
limiting current in the circuit and the probability of bias interruption.
Reverse
voltage. In systems with virtually unlimited current supply
(typically for tantalum capacitors used in power lines) an increase
in reverse voltage would significantly increase the probability
of hard failures starting from a certain threshold voltage, Vrth.
Below this voltage capacitors can withstand thousand of hours of
uninterrupted operation without hard failures. Based on our experiments
this threshold voltage is expected to be somewhere between 15% and
25% of the rated voltages. Most likely for capacitors rated for
35V and 50V this threshold is closer to 15%, whereas for the 20V
capacitors it is above 25%. This means in particular that all capacitors
rated above 20V would most likely withstand thousand of hours being
inversely installed in a 5Vpower bus system.
It
should be noted that the suggested model and the observed results
do not allow relating directly the reverse current degradation to
the rated voltage of capacitors or to the thickness of the pentoxide
layer. It is quite possible that the threshold voltage Vrth
is specific for a given lot of capacitors and cannot be determined
in terms of percentage of VR in a general case.
Obviously,
capacitors rated for low voltages at the same current levels and
derating conditions, would dissipate less power compared to the
high voltage capacitors and thus would be less prone to thermal
runaway and failures. This might be one of the reasons for better
performance of the 20V capacitors in our tests. Another reason could
be a slower crystallization process in capacitors with thin tantalum
pentoxide films compared to high voltage capacitors with relatively
thick oxide films [19].
Limiting
current. The level of limiting current strongly affects the
probability of hard failures under reverse bias conditions. In this
respect the behavior of tantalum capacitors is similar to behavior
of forward biased diodes. Similar to forward-biased diodes, hard
failures in reverse biased capacitors are also caused by a thermal
runaway, the probability of which depends on the current available
in the circuit and the thermal resistance of the part. If a capacitor
is used to filter input or output signals in a microcircuit, the
available current most likely will be low (milliamperes or less).
In this case the initial voltage at the capacitor can be much higher
than the threshold voltage Vrth, which is
determined for unlimited current conditions, and can reach up to
100% VR. The leakage current in such a capacitor would
relatively quickly (during a few hours) increase to the level limited
by the external circuit. This would decrease the voltage drop across
the capacitor thus limiting the power dissipated in the part and
preventing its catastrophic failure.
Temperature
and thermal resistance. Hard failures in inversely installed
tantalum capacitors are due to thermal run-away caused by increased
currents more-or-less evenly distributed along the tantalum slug.
Typically tantalum chip capacitors in normal mounting configurations
have thermal resistance of Rth » 100 ° C/W. This limits
the dissipation power to approximately 1 Watt (assuming that temperature
increase above 125 ° C will cause thermal runaway in the capacitor).
An increase in ambient temperature, Ta, and/or increase
in Rth, (due for example to use in a vacuum or degradation
of attachment to the board) would raise the temperature of a capacitor,
T = Ta + P*Rth and cause failure at a lower
level of power.
Bias
interruptions during operation. Power interruptions at early
stages of degradation under reverse bias conditions (the 1st
and the 2nd stages) would result in charge relaxation
at the Ta/Ta2O5 interface to original conditions
and thus might be considered as benign. However similar interruptions
after a long-term reverse bias stress (the 3rd stage
of reverse bias degradation) would significantly increase the probability
of failures. In this case hard failures could be expected within
minutes or hours after switching due to the triggered-by-interruption
failure mechanism discussed above.
According
to the described model of degradation, the most important material
parameters of capacitors affecting their robustness under reverse
bias conditions are the initial concentration of oxygen vacancies
in the tantalum pentoxide layer and the rate of their generation
at the Ta / Ta2O5 interface. The latter most
likely depends on purity of the tantalum slug and, in particular,
on concentration of oxygen. Obviously, these parameters depend on
the used materials and on manufacturing processes and are lot related
as it was observed in [1, 2]. Unfortunately there is no established
correlation between the material parameters and characteristics
of capacitors, which explains difficulties in predicting their reliability
under reverse bias conditions.
5. Conclusions
-
At
relatively low voltages, below 50% VR, the kinetics
of reverse bias currents features three stages. The first is
a relatively short (tens to thousands of seconds) period when
currents decrease with time. During the second, hours-scaled
stage, currents gradually increase approximately two to three
orders of magnitude. Then, during the third stage, currents
often exhibit erratic behavior and either reach maximum, after
which they are quasi-stabilizing at somewhat lower levels, or
continue to increase erratically. In the latter case the part
eventually fails due to a thermal run-away.
-
In
spite of significant increase in currents during the second
stage of reverse bias stress, the initial forward and reverse
characteristics of the capacitors can be restored after a few
minutes of depolarization and/or several seconds of forward
bias polarization. Irreversible degradation in capacitors occurs
during the third stage and results in a weakening of the electrical
strength of the tantalum pentoxide layer and in increasing of
the capacitance roll-off effect. The AC parameters of capacitors
(C at 1 kHz and ESR at 100 kHz) experienced relatively minor
changes.
-
The
experimental results suggest the existence of a threshold voltage
above which tantalum capacitors installed backwards would fail
within seconds, and below which they would withstand hundreds
and thousands of hours enduring relatively high leakage currents
(in the milliampere range) but without hard failures. Depending
on the type of capacitor this threshold voltage is probably
between 15% and 25% of the rated voltages.
-
The
probability of hard failures in tantalum capacitors, which are
installed in a reverse bias orientation on a board, depends
on application and, in particular, on the level of limiting
current in the circuit. Interruptions of applied voltage might
increase significantly the probability of failures. In applications
where the current is limited to a few milliamperes or less,
the initial voltage can be much larger than the threshold voltage
and the limiting level of leakage will be reached within a few
hours. Although no hard failures occur in this case, the reverse
currents are varying erratically creating significant noise
which can cause malfunctions in sensitive circuits.
-
The
behavior of forward polarization and depolarization currents
has been explained assuming that the forward current is a sum
of the absorption current, which varies with time according
to the power law, and the conductivity current, which does not
depend on time. The absorption currents are due to electron
trap hopping transport. The Pool-Frenkel mechanism controls
the conduction currents, which strongly depend on applied voltage
and temperature and have activation energy of 0.5-0.75 eV. These
currents are dominant at high voltage and temperature conditions.
-
A
mechanism of degradation in reverse biased tantalum capacitors
and factors affecting failures in systems with inversely installed
capacitors has been discussed. The 3-stage evolution of reverse
currents has been explained based on generation and migration
of oxygen vacancies in Ta/Ta2O5./MnO2
structures.
6.
References
-
G.J.Ewell,
Reverse bias characteristics of solid tantalum capacitors, CARTS’84,
pp. 21- 51, 1984.
-
M.J.Cozzolino,
R.C.Straessle, Design, characteristics, and failure mechanisms
of tantalum capacitors, CARTS’88, pp. 98-110, 1988.
-
I.Bishop
and J.Gill, Reverse voltage behavior of solid tantalum capacitors,
AVX Technical information, http://www.avxcorp.com.
-
J.Sikula,
J.Pavelka, J.Hlavka, V.Sedlakova, L.Grmela, The tantalum capacitor
as a MIS structure in reverse mode, CARTS’01, pp. 289-292, 2001.
-
Y.Pozdeev-Freeman,
Physical principles of the solid tantalum capacitors, CARTS’97,
pp. 161-165, 1997.
-
Y.Pozdeev-Freeman,
Battle for high CV tantalum capacitors, CARTS’01, pp. 35 -39,
2001.
-
S.Duenas,
H.Castan, J.Barbolla, R.R.Kola, P.A.Sullivan, Electrical characteristics
of anodic tantalum pentoxide thin films under thermal stress,
Microelectronics reliability, 40, (2000), pp. 659-62.
-
S.Ang,
W.Brown, Tantalum oxide dielectric for embedded capacitor applications,
Proc. Of the 6th International conf. On properties
and applications of dielectric materials, pp. 841-844, 2000.
-
G.Oehrlein,
Oxidation temperature dependence on the dc electrical conduction
characteristics and dielectric strength of thin Ta2O5 films
on silicon, J.Appl. Phys, 59 (5), March 1986, pp. 1587-1595.
-
S.Khanin,
Hopping electronic conduction in metal oxide films and
their insulating properties, Conduction and Breakdown
in Solid Dielectrics, 1992., Proceedings of the 4th International
Conference on , 1992, Page(s): 57 –61.
-
R.Franklin,
Analysis of solid tantalum capacitor leakage current, AVX Technical
information, http://www.avxcorp.com.
-
P.K.Watson,
The transport and trapping of electrons in polymers, Electrical
Insulation and Dielectric Phenomena, 1995. Annual Report., Conference
on , 1995, Page(s): 21 –27
-
S.Khanin,
Polaronic effects in disordered dielectrics,
9th International Symposium on Electrets, 1996. (ISE 9), Page(s):
93 –98.
-
B.T.Boiko,
P.A.Pachena, V.R.Kopach, Y.L.Pozdeev, Transformation in a metal/insulator/semiconductor
structure with an amorphous insulator film caused by contacts,
Thin solid films, 130 (1985), pp.341-355.
-
B.T.Boiko,
V.R.Kopach, S.M.Melentjev, P.A.Pachena, Y.L.Pozdeev, V.V.Starikov,
Comparison of the degradation modes in sandwich structures including
amorphous oxides of niobium and tantalum, Thin solid films,
229 (1993), pp.207-215.
-
R.Waser,
T.Baiatu, K.Hardtl, DC electrical degradation of pervoskite-type
titanates Ceramics, J. Am. Ceram. Soc., v.73 [6], pp. 1645 –
1662, 1990.
-
E.K.Reed,
J.C.Marshall, 18 milliohms and falling – new ultra low ESR tantalum
chip capacitors, CARTS’99, pp. 133 -141, 1999.
-
J.D.Prymak,
Replacing MnO2 with conductive polymer in solid tantalum capacitors,
CARTS’99, pp. 148 -153, 1999.
-
Y.Pozdeev-Freeman,
A. Gladkish, New problems and new decisions for low voltage
high CV tantalum capacitors, CARTS’99, pp. 142 -147, 1999.
7.
Acknowledgment
This
work was sponsored by NEPAG program at the Goddard Space Flight
Center. The author would like to thank Michael Sampson (EEE Parts
Assurance Group Manager, GSFC/NASA) and Jay Brusse (Sr. components
engineer, QSS Group) for useful discussions, careful review and
help with preparing this manuscript.
(back
to the top)
|