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Thermal Cycling Characterization
of Complementary Heterostructure Field Effect Transistors (CHFETs)
Test Report
Ashok
K. Sharma
Goddard
Space Flight Center/NASA
Wallace T. Anderson and Jeffrey A. Mittereder
Naval Research Laboratory
Muzar
Jah
Howard University
Background
Complementary
heterostructure field effect transistor (CHFET) is an advanced GaAS
based IC technology that offers up to 4x higher speed and 6x lower
power dissipation than silicon based CMOS technology. The CHFET
technology was developed by Honeywell SSEC for DOD applications
and according to the manufacturer, additional features include CMOS
like design flexibility with complementary N-channel and P-channel
FETs), high switching speed (multi-GHz), wide operating temperature
range (4° K to 400° C), and inherent radiation hardness.
These features made the CHFET an attractive candidate for potential
use by JPL X2000/Europa Oribter project. Honeywell SSEC provided
JPL X2000 project with several wafer lots of CHFETs. In order to
space qualify these CHFETs, DC/RF life testing was proposed by JPL
as part of NEPP task requirements, where as GSFC was to focus on
thermal cycling characterization of these devices. Several sample
devices (chips in bare die form) were sent to GSFC for thermal cycling.
Test Description
The major activities
that were performed as part of thermal cycling (TC) of CHFETs, with
the goal of device space qualification, are listed below.
- A litereature
search was conducted to determine, what test results had previously
been reported that were related to the thermal cycling of CHFETs.
During the search, approximately 40 references were found through
the NRL Library system, and the Honeywell CHFET web site was also
reviewed. The information gathered from these references was helpful
in generating the test plan for CHFET devices supplied. Although,
Honeywell provided very little background information about their
proprietary process, the literature search revealed that the CHFET
structure had been developed with a Al0.75GaAs/In0.25GaAs/GaAs
structure, which was suitable for commercial digital integrated
circuits applications.
- CHFET chips
fabricated by Honeywell for the X2000/Europa Orbiter project were
electrically characterized prior to thermal cycling. These chips,
contained many individual CHFETs with common gates that were all
connected. Figure 1 shows a representative CHFET device from the
"drain" end.
Each bare
die contained 38 columns of FETs, with 5 pairs of source and drain
contact pads per column, and interconnected gate contacts at the
top and bottom of each column. Two of the chips that were sent
to GSFC had large die cracks, and were used for preliminary testing.
A total of eight (8) individual CHFETs were electrically characterized,
with at least 2 devices from each chip. One bare die was used
as a control sample before and after the TC tests, throughout
the TC test sequence.
- CHFET chips
that had been electrically characterized were placed in a thermal
control chamber and TC performed, according to the NASA GaAs MMIC
Reliability Assurance Guideline for Space Applications (JPL Publication
96-25, 15 December 1996, p. 164). The chips were cycled between
65° C and 200oC for a total of 15 cycles. One
chip was held back as a control and was not temperature cycled.
As stated in the guideline, packaged devices are normally used
for the TC test "to detect flaws or weak point in the die attach,
wire bonds, and package seals that would normally result in early
failures." However, there are also thermal/mechanical stresses
between the metallization and the semiconductor layers, and between
the heterojunction semiconductor layers. No information was available
about the intended application and/or packaging scheme for these
parts. Therefore, the objective of TC was to evaluate any degradation
effects at the chip level.
- After the
thermal cycling tests were completed, the pre- and post- TC electrical
measurements were performed, and any changes in electrical characteristics
were noted. Failure was defined as a 20% change in the drain current,
gate leakage current, or threshold voltage measurements.
| Figure
1. Drain end of a CHFET bare die at 50x magnification. D## =
Drain/column #/row #; S## = Source/col.#/row#; G# = Gate column
#; Gt/b = Gate top/bottom. |
Test Results
Table 1 shows
pre- and post- thermal cycling electrical characteristics NPN transistors
for (a) Seven CHFET chips that were actually thermal cycled, and
(b) One control CHFET chip.
Table 2 shows
pre- and post- thermal cycling electrical characteristics PNP transistors
for (a) Seven CHFET chips that were actually thermal cycled, and
(b) One control CHFET chip.
Both tables
show the test conditions and limits. The last column of the tables
show drain current pre- and post- cycling (Iu Ic) 20 % max allowable
change limit and actual change (%). Figure 2 shows typical drain
current characteristic curves for a NPN transistor (a) Before cycling,
and (b) After cycling. Figure 3 shows typical drain current characteristic
curves for a PNP transistor (a) Before cycling, and (b) After cycling.
It should be
noted that for all seven devices, the change between uncycled and
cycled saturated current was less than the 20% failure criteria.
Therefore, all devices were considered as passing the established
failure criteria limit.
| |
|
NPN
Id
@ Vds= 2.5V, Vgs= 0.6V
(mA)
|
Drain
Current (Iu Ic)
|
|
SAMPLE
|
DEVICE
|
Uncycled
(Iu)
|
Cycled
(Ic)
|
(Iu
Ic)
|
20%max
allowable change (mA)
|
Actual
change
(%)
|
|
1
|
D1
|
330
|
285
|
45
|
66
|
-14
|
|
1
|
D20
|
330
|
330
|
0
|
66
|
0
|
|
2
|
D1
|
320
|
330
|
-10
|
64
|
3
|
|
2
|
D20
|
330
|
330
|
0
|
66
|
0
|
|
3
|
D1
|
315
|
315
|
0
|
63
|
0
|
|
3
|
D20
|
330
|
350
|
-20
|
66
|
6
|
|
4
|
D1
|
310
|
320
|
-10
|
62
|
3
|
|
4
|
D20
|
345
|
375
|
-30
|
69
|
9
|
|
5
|
D1
|
400
|
360
|
-40
|
80
|
-10
|
|
5
|
D20
|
425
|
425
|
0
|
85
|
0
|
|
6
|
D1
|
380
|
345
|
35
|
76
|
-9
|
|
6
|
D20
|
435
|
410
|
25
|
87
|
-6
|
|
7
|
D1
|
375
|
360
|
15
|
75
|
-4
|
|
7
|
D20
|
410
|
410
|
0
|
82
|
0
|
Table
1(a). Table of NPN electrical characteristics pre- and post- thermal
cycling for seven CHFET chips.
| |
CONTROL
SAMPLE 8: D12G1T
|
| |
NPN
Id
@ Vds= 2.5V, Vgs= 0.6V
(mA)
|
|
Cycling
Samples
|
Before
Cycling
(Ib)
|
After
Cycling
(Ia)
|
Ib-Ia
|
Ib
- Ia Change
(%)
|
|
Sample
1
|
325
|
325
|
0
|
0
|
|
Samples
2,3,4
|
325
|
330
|
-5
|
2
|
|
Samples
5,6,7
|
330
|
350
|
-20
|
6
|
Table
1(b). Table of NPN electrical characteristics for the control CHFET
chip.
|
|
|
PNP
I
@ Vds= 0.8 Vgs=0.8V
(mA)
|
Drain
Current (Iu-Ic)
|
|
SAMPLE
|
DEVICE
|
Uncycled
(Iu)
|
Cycled
(Ic)
|
Iu
-Ic
|
20%max
allowable change (mA)
|
Actual
change (%)
|
|
1
|
D1
|
250
|
*
|
*
|
50
|
*
|
|
1
|
D20
|
200
|
190
|
10
|
40
|
-5
|
|
2
|
D1
|
225
|
225
|
0
|
45
|
0
|
|
2
|
D20
|
230
|
200
|
30
|
46
|
-13
|
|
3
|
D1
|
200
|
225
|
-25
|
40
|
13
|
|
3
|
D20
|
150*
|
*
|
*
|
30
|
*
|
|
4
|
D1
|
215
|
225
|
-10
|
43
|
5
|
|
4
|
D20
|
150*
|
*
|
*
|
30
|
*
|
|
5
|
D1
|
210
|
200
|
10
|
42
|
-5
|
|
5
|
D20
|
205
|
210
|
-5
|
41
|
2
|
|
6
|
D1
|
230
|
275
|
-45
|
46
|
20
|
|
6
|
D20
|
245
|
255
|
-10
|
49
|
4
|
|
7
|
D1
|
220
|
210
|
10
|
44
|
-5
|
|
7
|
D20
|
230
|
200
|
20
|
46
|
-9
|
*Insufficient
data--could not be measured accurately
Table
2(a). Table of PNP electrical characteristics pre- and post- thermal
cycling for seven CHFET chips.
|
|
CONTROL
SAMPLE 8: D12G1T
|
|
|
PNP
Id
@ Vds= 0.8V, Vgs=0.8V
(mA)
|
|
Cycling
Samples
|
Before
Cycling
(Ib)
|
After
Cycling
(Ia)
|
Ib-Ia
|
Ib
- Ia Change
(%)
|
|
Sample
1
|
200
|
215
|
-15
|
8
|
|
Samples
2,3,4
|
215
|
205
|
10
|
-5
|
|
Samples
5,6,7
|
205
|
230
|
-25
|
12
|
Table
2(b). Table of NPN electrical characteristics for the control CHFET
chip.
|
|
|
|
Figure
2a. Device #7 (7UD12G1T) npn characteristics before
cycling.
|
Figure
2b. Device #7 (7UD12G1T) npn characteristics after
cycling.
|
|
|
|
|
Figure
3a. Device #8 (8UD12G1T) npn characteristics before
cycling of chips 5, 6, and 7
|
Figure
3b. Device #8 (8UD12G1T) npn characteristics after
cycling of chips 5, 6, and 7
|
Summary
Complementary
heterostructure FET (CHFET) chips manufactured by Honeywell SSEC
and intended for usage in X2000/Europa Orbiter projects were supplied
to GSFC for thermal cycling characterization testing. These chips
contained several NPN and PNP transistors. A total of eight chips
were electrically characterized with at least two devices from each
chip. One bare die was used as control sample for before and after
the TC testing. The devices were cycled between 65° C and
200° C for a total of 15 cycles, in accordance with NASA MIMIC
Reliability Assurance Guideline for Space Applications. Failure
was defined as a 20 % change in the pre- and post- TC for drain
current, gate leakage current or threshold voltage. The pre- and
post- thermal cycling measurements showed all test devices meeting
this criteria, and were considered as passing. No signs of device
degradation were observed during optical inspection after the completion
of thermal cycling.
Acknowledgements
This work was
supported by the NEPP Program funded by NASA HQ and was performed
as a part of the task entitled: "Reliability of the Complementary
GaAs Devices". Acknowledgements are due to Rosa Leon and JPL
X2000/Europa Orbiter project for supplying the parts used for this
testing.
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